國立清華大學藝術與設計學系 Department of Arts & Design NTHU

A + Artist Residency Exchange Program
A+ :artists, designers, curators or researchers

A+ 駐地交流計畫申請

A + Artist Residency Exchange Program

A+ :藝術家.設計師.策展人.研究人員

A+ :artists, designers, curators or researchers

A+ 駐地交流計畫申請

宗旨

希冀駐系藝術家/設計師/策展或研究人員,藉由其豐富的創作歷程、設計實務和研究與學生交流,旨在拓展學生視野、鼓勵跨域思考,讓系所充滿藝術的能量與活力。

申請條件

不限國籍之藝術家、設計師、策展人(含研究人員),且從事藝術創作、設計專業、策展或研究 2 年以上之經驗者,皆可提出申請。

申請時間截止日期

隨到隨審。

繳交資料

(1) 國立清華大學藝術與設計學系「A+ 駐地交流計畫申請表」。
(2) 歷年作品/設計經歷、個人介紹簡報檔(含個人照、10 張以上作品相關圖檔或影音資料,並附上作品資訊〔作品名稱、尺寸媒材、年代等〕)

報名及送件

以電子郵件方式寄送,並於「主旨」欄註明:A+駐地交流計畫_申請者姓名,E-mail:[email protected] 。

注意事項

(1) 申請人所繳交資料(含作品圖檔),如經查證有虛假不實或侵犯他人權益者,應即刻取消其資格,並由申請人負責所涉及法律責任。
(2) 獲選人須同意單位所要求的相關文字、圖片或影音資料以供教育及宣傳使用,並同意配合出席單位所安排的相關活動。

A + Artist Residency Exchange Program

Objective

The program aims to invite resident artists/designers/curators or researchers to engage with students through their rich creative experiences, design practices, and research, with the goal of expanding students’ horizons, encouraging interdisciplinary thinking, and infusing the department with artistic energy and vitality.

Application Requirements

Artists, designers, curators (including researchers) of any nationality who have at least 2 years of experience in artistic creation, design, curation, or research are eligible to apply.

Application Deadline

Applications will be reviewed on a rolling basis.

Required Documents

(1) “A + Artist Residency Exchange Program Application Form” offered by Department of Arts and Design, National Tsing Hua University.
(2) Portfolio of past artistic/design experiences and personal introduction presentation file (including personal photo, at least 10 images or audiovisual materials related to your works, and accompanying information such as title, dimensions, medium, and year).

Application and Submission

Applications should be sent via email, with the subject line indicating: “A + Artist Residency Exchange Program_ Applicant’s Name.” Send the required documents to: E-mail:[email protected] 

Notes

(1) If it is found that the materials submitted by the applicant (including artwork images) contain false information or infringe upon the rights of others, the qualification will be immediately withdrawn, and the applicant shall bear any legal responsibilities incurred.
(2) Selected applicants must agree to provide the relevant texts, images, or audiovisual materials requested by the department for educational and promotional purposes, and agree to participate in related activities arranged by the department.”